化学増幅レジスト材料及びパターン形成方法

Abstract

<P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist material sensitive to a high energy ray and excellent in sensitivity and transparency at &le;200 nm, particularly &le;170 nm wavelength. <P>SOLUTION: The chemically amplified resist material comprises (A) a high molecular compound having a repeating unit containing at least one fluorine atom, (B) a compound of formula (1) (where R<SP>1</SP>and R<SP>2</SP>are each H, F, alkyl or fluoroalkyl, at least one of R<SP>1</SP>and R<SP>2</SP>contains F; R<SP>3</SP>is a single bond or alkylene; R<SP>4</SP>is a 4-40C n-valent organic group having at least one aromatic ring or diene ring; R<SP>5</SP>is H or C(=O)R<SP>6</SP>; R<SP>6</SP>is H or CH<SB>3</SB>; and n is 2, 3 or 4), (C) an organic solvent and (D) an acid generator. <P>COPYRIGHT: (C)2003,JPO

Claims

Description

Topics

Download Full PDF Version (Non-Commercial Use)

Patent Citations (0)

    Publication numberPublication dateAssigneeTitle

NO-Patent Citations (0)

    Title

Cited By (0)

    Publication numberPublication dateAssigneeTitle